Publication Information

Title:
Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
Type:
Journal
Info:
Japanese Journal of Applied Physics 46, L173 (2007)
Date:
2006-12-06

Author Information

Name Institution
Keunjun KimHanyang University
Keunwoo LeeHanyang University
Sejin HanHanyang University
Taeyong ParkHanyang University
Youngjin LeeHynix Semiconductor
Jeongtae KimHynix Semiconductor
Seungjin YeomHynix Semiconductor
Hyeongtag JeonHanyang University

Films

Plasma Co


Plasma Co


Plasma Co


Plasma Co


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Keywords

Notes

1012