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Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
Type:
Journal
Info:
Journal of Energy Chemistry 22 (2013) 403-407
Date:
2013-03-15
Author Information
| Name | Institution |
|---|---|
| Jusang Park | Yonsei University |
| Han-Bo-Ram Lee | Incheon National University |
| Doyoung Kim | Ulsan National Institute of Science and Technology |
| Jaehong Yoon | Yonsei University |
| Clement Lansalot | Air Liquide |
| Julien Gatineau | Air Liquide |
| Henri Chevrel | Air Liquide |
| Hyunjun Kim | Yonsei University |
Films
Plasma Co
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Si(001) |
| SiO2 |
Notes
| 1590 |