Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma

Type:
Journal
Info:
Materials Letters, Volume 166, Pages 163 - 166
Date:
2015-12-10

Author Information

Name Institution
Dong-Kwon LeePusan National University
Zhixin WanPusan National University
Jong-Seong BaeKorean Basic Science Institute
Han-Bo-Ram LeeIncheon National University
Ji-Hoon AhnKorea Maritime and Ocean University
Sangdeok KimHynix Semiconductor
Ja-Yong KimHynix Semiconductor
Se-Hun KwonPusan National University

Films

Plasma SnO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Characteristic: Mobility
Analysis: van der Pauw sheet resistance

Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance

Characteristic: Corrosion Potential
Analysis: Potentiodynamic Polarization Test

Characteristic: Corrosion Current Density
Analysis: Potentiodynamic Polarization Test

Substrates

Si(100)
Corning XG Glass
Stainless Steel 316L

Notes

519