Publication Information

Title:
Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 55, No. 3, pp. 999-1004
Date:
2008-08-26

Author Information

Name Institution
Sung-Ku KwonKunsan National University
Dae-Woon KimKunsan National University
Yong-Ho JungNational Fusion Research Institute
Bong-Ju LeeNational Fusion Research Institute

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Substrates

Si(100)
Quartz

Keywords

Notes

ICP uses 27.12MHz
1344