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Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 55, No. 3, pp. 999-1004
Date:
2008-08-26
Author Information
| Name | Institution |
|---|---|
| Sung-Ku Kwon | Kunsan National University |
| Dae-Woon Kim | Kunsan National University |
| Yong-Ho Jung | National Fusion Research Institute |
| Bong-Ju Lee | National Fusion Research Institute |
Films
Plasma ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
| Si(100) |
| Quartz |
Notes
| ICP uses 27.12MHz |
| 1344 |