Title: Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
Type: Journal
Info: Journal of the Korean Physical Society, Vol. 54, No. 3, pp. 1048-1053
Date: 2008-06-16
DOI: http://old.kps.or.kr/jkps/abstract_view.asp?articleuid=F2AC8C97-6957-4BBE-BD9B-3EE9E6A5E4D0
Name
Institution
Kunsan National University
Characteristic
Analysis
Diagnostic
Gas Phase Species
OES, Optical Emission Spectroscopy
Unknown
Thickness
Ellipsometry
Unknown
Refractive Index
Ellipsometry
Unknown
Uniformity
Ellipsometry
Unknown
Silicon
Modeling
Plasma vs Thermal Comparison
Compared three different ICP sources on the same chamber.
Discusses sample heating from plasma.
711
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