Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2

Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 54, No. 3, pp. 1048-1053
Date:
2008-06-16

Author Information

Name Institution
Junghoon JooKunsan National University
S. M. RossnagelIBM

Films

Plasma TiO2


Plasma TiO2


Thermal TiO2


Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Uniformity
Analysis: Ellipsometry

Substrates

Silicon

Notes

Compared three different ICP sources on the same chamber.
Discusses sample heating from plasma.
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