Title: Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
Type: Journal
Info: Journal of the Korean Physical Society, Vol. 54, No. 3, pp. 1048-1053
Date: 2008-06-16
DOI: http://old.kps.or.kr/jkps/abstract_view.asp?articleuid=F2AC8C97-6957-4BBE-BD9B-3EE9E6A5E4D0
Name
Institution
Kunsan National University
Characteristic
Analysis
Diagnostic
Gas Phase Species
OES, Optical Emission Spectroscopy
-
Thickness
Ellipsometry
-
Refractive Index
Ellipsometry
-
Uniformity
Ellipsometry
-
Silicon
Modeling
Plasma vs Thermal Comparison
Compared three different ICP sources on the same chamber.
Discusses sample heating from plasma.
711
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