Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
Type:
Journal
Info:
Applied Physics Letters 95, 013114 (2009)
Date:
2009-06-23
Author Information
| Name | Institution |
|---|---|
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| S. A. F. Dielissen | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
Films
Plasma Pt
Film/Plasma Properties
Substrates
| Silicon |
| Pt |
Notes
| PEALD Pt was used as the seed layer for the thermal ALD Pt which was the focus of the article. |
| 759 |