Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

Type:
Journal
Info:
Applied Physics Letters 95, 013114 (2009)
Date:
2009-06-23

Author Information

Name Institution
Erwin (W.M.M.) KesselsEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
S. A. F. DielissenEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology

Films


Thermal Pt


Film/Plasma Properties

Substrates

Silicon
Pt

Keywords

Notes

PEALD Pt was used as the seed layer for the thermal ALD Pt which was the focus of the article.
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