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Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
Type:
Journal
Info:
Applied Physics Letters 89, 081915 (2006)
Date:
2006-07-03
Author Information
| Name | Institution |
|---|---|
| E. Langereis | Eindhoven University of Technology |
| Mariadriana Creatore | Eindhoven University of Technology |
| S. B. S. Heil | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Al2O3
Plasma AlON
Plasma AlN
Film/Plasma Properties
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| PEN, Polyethylene Napthalate |
| Silicon |
Notes
| 1448 |