Publication Information

Title:
Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
Type:
Journal
Info:
Applied Physics Letters 89, 081915 (2006)
Date:
2006-07-03

Author Information

Name Institution
E. LangereisEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology
S. B. S. HeilEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Plasma AlON



Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

PEN, Polyethylene Napthalate
Silicon

Keywords

Intentional Underdosing
Diffusion Barrier

Notes

1448