Publication Information

Title:
Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
Type:
Journal
Info:
Applied Physics Letters 92, 231904 (2008)
Date:
2008-05-17

Author Information

Name Institution
E. LangereisEindhoven University of Technology
J. KeijmelEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Surface Hydroxyl Concentration
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Surface Reactions
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

KBr

Keywords

Reaction Mechanism

Notes

1436