Plasma enhanced atomic layer deposition of zinc sulfide thin films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B111 (2017)
Date:
2016-10-27
Author Information
| Name | Institution |
|---|---|
| Jakob Kuhs | Ghent University |
| Thomas Dobbelaere | Ghent University |
| Zeger Hens | Ghent University |
| Christophe Detavernier | Ghent University |
Films
Plasma ZnS
Thermal ZnS
Film/Plasma Properties
Characteristic: Transmittance
Analysis: Optical Transmission
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
| SiO2 |
| Quartz |
Notes
| 895 |