Publication Information

Title: Plasma enhanced atomic layer deposition of zinc sulfide thin films

Type: Journal

Info: Journal of Vacuum Science & Technology A 35, 01B111 (2017)

Date: 2016-10-27

DOI: http://dx.doi.org/10.1116/1.4967724

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Films

Plasma ZnS using Custom ICP

Deposition Temperature Range = 60-300C

557-20-0

7783-06-4

7440-37-1

Thermal ZnS using Custom ICP

Deposition Temperature Range = 60-300C

557-20-0

7783-06-4

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Transmittance

Optical Transmission

PerkinElmer lambda 950 Spectrophotometer

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

-

Images

SEM, Scanning Electron Microscopy

-

Thickness

Ellipsometry

J.A. Woollam M-2000

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo VG-Scientific theta probe

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Plasma Species

OES, Optical Emission Spectroscopy

Ocean Optics QE Pro

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Hiden HPR-30

Substrates

SiO2

Quartz

Keywords

Plasma vs Thermal Comparison

Notes

895



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