Search 1553 plasma ALD publications by:
Search 1553 plasma ALD publications by:
Publication Information
Title:
Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
Type:
Journal
Info:
Chem. Mater., 2014, 26 (23), pp 6863-6871
Date:
2014-11-14
Author Information
Name | Institution |
---|---|
Thomas Dobbelaere | Ghent University |
Films
Plasma AlPxOy
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: OES
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Gas Phase Species
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
Silicon |
Keywords
Plasma-Enhanced Atomic Layer Deposition |
Notes
Available as chapter 3 in on-line thesis: Plasma-enhanced atomic layer deposition of transition metal phosphates |
240 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |