Publication Information

Title: Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate

Type: Journal

Info: Chem. Mater., 2014, 26 (23), pp 6863-6871

Date: 2014-11-14

DOI: http://dx.doi.org/10.1021/cm503587w

Author Information

Name

Institution

Thomas Dobbelaere

Ghent University

Films

Plasma AlPxOy using Custom ICP

Deposition Temperature Range = 50-320C

TMA, AlMe3, Trimethyl Aluminum

75-24-1

Where to buy precursor

Trimethyl phosphate, TMP, (MeO)3PO

512-56-1

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

OES

OES, Optical Emission Spectroscopy

Unknown

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Unknown

Gas Phase Species

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Substrates

Silicon

Keywords

Plasma-Enhanced Atomic Layer Deposition

Notes

240


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2019 plasma-ald.com