Publication Information

Title: Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate

Type: Journal

Info: Chem. Mater., 2014, 26 (23), pp 6863-6871

Date: 2014-11-14

DOI: http://dx.doi.org/10.1021/cm503587w

Author Information

Name

Institution

Ghent University

Films

Plasma AlPxOy using Custom ICP

Deposition Temperature Range = 50-320C

75-24-1

512-56-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

OES

OES, Optical Emission Spectroscopy

-

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

-

Gas Phase Species

FTIR, Fourier Transform InfraRed spectroscopy

-

Substrates

Silicon

Keywords

Plasma-Enhanced Atomic Layer Deposition

Notes

240



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