The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
Type:
Journal
Info:
APPLIED PHYSICS LETTERS 89, 131505 (2006)
Date:
2006-09-04
Author Information
| Name | Institution |
|---|---|
| S. B. S. Heil | Eindhoven University of Technology |
| P. Kudlacek | West Bohemia University |
| E. Langereis | Eindhoven University of Technology |
| R. Engeln | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
Notes
| Custom ICP PEALD Al2O3 reaction mechanism study. |
| 188 |