
In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
Type:
Journal
Info:
APPLIED PHYSICS LETTERS 89, 131505 (2006)
Date:
2006-09-04
Author Information
Name | Institution |
---|---|
S. B. S. Heil | Eindhoven University of Technology |
P. Kudlacek | West Bohemia University |
E. Langereis | Eindhoven University of Technology |
R. Engeln | Eindhoven University of Technology |
Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
Notes
Custom ICP PEALD Al2O3 reaction mechanism study. |
188 |