Publication Information

Title:
In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
Type:
Journal
Info:
APPLIED PHYSICS LETTERS 89, 131505 (2006)
Date:
2006-09-04

Author Information

Name Institution
S. B. S. HeilEindhoven University of Technology
P. KudlacekWest Bohemia University
E. LangereisEindhoven University of Technology
R. EngelnEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

Keywords

Reaction Kinetics

Notes

Custom ICP PEALD Al2O3 reaction mechanism study.
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