Publication Information

Title:
Plasma enhanced atomic layer deposition of aluminum sulfide thin films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A113 (2018)
Date:
2017-11-08

Author Information

Name Institution
Jakob KuhsGhent University
Zeger HensGhent University
Christophe DetavernierGhent University

Films

Plasma AlS



Thermal AlS


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

SiO2
Micropillar Arrays

Keywords

Notes

1045