Plasma enhanced atomic layer deposition of aluminum sulfide thin films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A113 (2018)
Date:
2017-11-08
Author Information
| Name | Institution |
|---|---|
| Jakob Kuhs | Ghent University |
| Zeger Hens | Ghent University |
| Christophe Detavernier | Ghent University |
Films
Plasma AlS
Plasma AlS
Thermal AlS
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| SiO2 |
| Micropillar Arrays |
Notes
| 1045 |