Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 052409 (2020)
Date:
2020-07-21
DOI:
http://dx.doi.org/10.1116/6.0000271

Author Information

Name Institution
Brian C. WelchUniversity of Colorado, Boulder
Olivia M. McInteeUniversity of Colorado, Boulder
Anand B. OdeUniversity of Colorado, Boulder
Bonnie B. McKenzieSandia National Laboratories
Alan R. GreenbergUniversity of Colorado, Boulder
Victor M. BrightUniversity of Colorado, Boulder
Steven GeorgeUniversity of Colorado, Boulder

Films

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Air Permeability
Analysis: Custom
Diagnostic: Custom

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi SU-3500

Characteristic: Images
Analysis: Optical Microscopy
Diagnostic: Micromanipulator 6000

Substrates

AAO, Anodic Aluminum Oxide
Silicon

Notes

1535