Publication Information

Title:
Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
Type:
Journal
Info:
Journal of Applied Physics 112, 124102 (2012)
Date:
2012-11-07

Author Information

Name Institution
Hsin-Wei HuangNational Tsing Hua University
Wen-Chih ChangNational Tsing Hua University
Su-Jien LinNational Tsing Hua University
Yu-Lun ChuehNational Tsing Hua University

Films

Thermal ZnO


Plasma ZnO


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy

Characteristic: Optical Absorption
Analysis: UV-VIS Spectroscopy

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

SiO2

Keywords

Plasma vs Thermal Comparison

Notes

1471