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Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
Type:
Journal
Info:
Journal of Applied Physics 112, 124102 (2012)
Date:
2012-11-07
Author Information
| Name | Institution |
|---|---|
| Hsin-Wei Huang | National Tsing Hua University |
| Wen-Chih Chang | National Tsing Hua University |
| Su-Jien Lin | National Tsing Hua University |
| Yu-Lun Chueh | National Tsing Hua University |
Films
Thermal ZnO
Plasma ZnO
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Optical Absorption
Analysis: UV-VIS Spectroscopy
Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
| SiO2 |
Notes
| 1471 |