Publication Information

Title: Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Type: Journal

Info: Chem. Commun., 2015,51, 3556-3558

Date: 2015-01-22

DOI: http://dx.doi.org/10.1039/C4CC09474C

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

Films

Thermal Al2O3 using Custom ICP

Deposition Temperature = 150C

75-24-1

7732-18-5

Plasma Al2O3 using Custom ICP

Deposition Temperature = 150C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

FEI Quanta 200 FEG

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

FEI Quanta 200 FEG

Wetting Angle

Sessile Drop Tests

Advex

Substrates

PTFE

Keywords

Hydrophilic

Notes

Custom ICP PEALD and thermal ALD Al2O3 comparison for improving wettability and gluability of PTFE.

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