Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Type:
Journal
Info:
Chem. Commun., 2015,51, 3556-3558
Date:
2015-01-22
DOI:
http://dx.doi.org/10.1039/C4CC09474C

Author Information

Name Institution
Amit K. RoyGhent University
Jolien DendoovenGhent University
Davy DeduytscheGhent University
Kilian Devloo-CasierGhent University
Kim RagaertGhent University
Ludwig CardonGhent University
Christophe DetavernierGhent University

Films

Thermal Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 150C

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Wetting Angle
Analysis: Sessile Drop Tests
Diagnostic: Advex

Substrates

PTFE

Notes

Custom ICP PEALD and thermal ALD Al2O3 comparison for improving wettability and gluability of PTFE.
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