Publication Information

Title:
The effects of plasma treatment on the thermal stability of HfO2 thin films
Type:
Journal
Info:
Applied Surface Science 254 (2008) 6116 - 6118
Date:
2008-02-01

Author Information

Name Institution
Kow-Ming ChangNational Chiao Tung University
Bwo-Ning ChenNational Chiao Tung University
Shih-Ming HuangNational Chiao Tung University

Films

Other HfO2


Other HfO2


Film/Plasma Properties

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Substrates

Keywords

Notes

Thermal HfO2 films subjected to N2 or N2O plasmas to change dielectric properties.
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