Publication Information

Title:
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2020, 22, 9262-9271
Date:
2020-04-07

Author Information

Name Institution
Sofie S. T. VandenbrouckeGhent University
Elisabeth LevrauGhent University
Matthias M. MinjauwGhent University
Michiel Van DaeleGhent University
Eduardo SolanoGhent University
Rita VosIMEC
Jolien DendoovenGhent University
Christophe DetavernierGhent University

Films




Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

TiN
Silicon

Keywords

Reaction Mechanism
Plasma vs Thermal Comparison

Notes

1501