Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2020, 22, 9262-9271
Date:
2020-04-07
DOI:
http://dx.doi.org/10.1039/D0CP00395F

Author Information

Name Institution
Sofie S. T. VandenbrouckeGhent University
Elisabeth LevrauGhent University
Matthias M. MinjauwGhent University
Michiel Van DaeleGhent University
Eduardo SolanoGhent University
Rita VosIMEC
Jolien DendoovenGhent University
Christophe DetavernierGhent University

Films

Plasma TiO2

Hardware used: Custom Remote Inductively Coupled Plasma
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Plasma TiO2

Hardware used: Custom Remote Inductively Coupled Plasma
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 100C

Thermal TiO2

Hardware used: Custom Remote Inductively Coupled Plasma
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Substrates

TiN
Silicon

Notes

1501