Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Plasma-enhanced atomic layer deposition of zinc phosphate

Type:
Journal
Info:
Journal of Non-Crystalline Solids Volume 444, 2016, Pages 43 - 48
Date:
2016-04-15
DOI:
http://dx.doi.org/10.1016/j.jnoncrysol.2016.04.032

Author Information

Name Institution
Thomas DobbelaereGhent University
Matthias M. MinjauwGhent University
T. AhmadGhent University
Philippe M VereeckenIMEC
Christophe DetavernierGhent University

Films

Plasma ZnPO4

Hardware used: Custom Remote Inductively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Substrates

Notes

Available as chapter 4 in on-line thesis: Plasma-enhanced atomic layer deposition of transition metal phosphates
823