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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Carbon content control of silicon oxycarbide film with methane containing plasma
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Publication Information
Title:
Plasma-enhanced atomic layer deposition of zinc phosphate
Type:
Journal
Info:
Journal of Non-Crystalline Solids Volume 444, 2016, Pages 43 - 48
Date:
2016-04-15
Author Information
| Name | Institution |
|---|---|
| Thomas Dobbelaere | Ghent University |
| Matthias M. Minjauw | Ghent University |
| T. Ahmad | Ghent University |
| Philippe M Vereecken | IMEC |
| Christophe Detavernier | Ghent University |
Films
Plasma ZnPO4
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Keywords
Notes
| 823 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |