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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Plasma-enhanced atomic layer deposition of zinc phosphate
Type:
Journal
Info:
Journal of Non-Crystalline Solids Volume 444, 2016, Pages 43 - 48
Date:
2016-04-15
Author Information
| Name | Institution |
|---|---|
| Thomas Dobbelaere | Ghent University |
| Matthias M. Minjauw | Ghent University |
| T. Ahmad | Ghent University |
| Philippe M Vereecken | IMEC |
| Christophe Detavernier | Ghent University |
Films
Plasma ZnPO4
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Keywords
Notes
| Available as chapter 4 in on-line thesis: Plasma-enhanced atomic layer deposition of transition metal phosphates |
| 823 |