Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40, 012404 (2022)
Date:
2021-11-22

Author Information

Name Institution
Daniel C. MessinaArizona State University
Brianna S. EllerArizona State University
Paul A. ScowenArizona State University
Robert J. NemanichArizona State University

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Al2O3

Notes

1659