Publication Information

Title:
Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 211, Issue 9, pages 2166-2171, September 2014
Date:
2014-05-08

Author Information

Name Institution
Woochool JangHanyang University

Films

Plasma SiNx


Film/Plasma Properties

Substrates

Keywords

Notes

235