Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 211, Issue 9, pages 2166-2171, September 2014
Date:
2014-05-08
Author Information
| Name | Institution |
|---|---|
| Woochool Jang | Hanyang University |
Films
Plasma SiNx
Film/Plasma Properties
Substrates
Notes
| 235 |