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Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
Experimental and theoretical determination of the role of ions in atomic layer annealing
Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
Where to buy Trisilylamine [N(SiH3)3] CAS# 13862-16-3
Trisilylamine [N(SiH3)3] CAS# 13862-16-3 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Pegasus Chemicals | 🇬🇧 | trisilylamine |
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