Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Trisilylamine [N(SiH3)3] CAS# 13862-16-3

Trisilylamine [N(SiH3)3] CAS# 13862-16-3 is available from the following source(s):

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧trisilylamine
2DOCK/CHEMICALS🇩🇪Trisilylamine

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