2022 Year in Review

May 2023 Stats


The publication database currently has 1686 entries.
208 Films
282 Precursors
78 Dep Hardware Sets
254 Characteristics
93 Theses
5172 Authors

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2021 Year in Review
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Recent Database Additions
Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis Experimental and theoretical determination of the role of ions in atomic layer annealing Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature

Woochool Jang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Woochool Jang returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
2Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
3Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
4Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
5The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
6Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
7Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2

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