Woochool Jang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Woochool Jang returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
2Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
3Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
4Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
5Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
6The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer