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Publication Information

Title: Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

Type: Journal

Info: J. Phys. Chem. C, 2009, 113 (30), pp 12962-12965

Date: 2009-06-08

DOI: http://dx.doi.org/10.1021/jp903669c

Author Information

Name

Institution

Colorado School of Mines

Colorado School of Mines

Films

Plasma TiO2 using Custom ICP

Deposition Temperature = 150C

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Reactions

ATR-FTIR

Unknown

Thickness

Ellipsometry

J.A. Woollam M-44

Refractive Index

Ellipsometry

J.A. Woollam M-44

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Substrates

ZnSe

Silicon

Keywords

Reaction Mechanism

Notes

758



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