Room-Temperature Atomic Layer Deposition of Platinum
Type:
Journal
Info:
Chem. Mater., 2013, 25 (9), pp 1769-1774
Date:
2013-03-18
Author Information
| Name | Institution |
|---|---|
| Adriaan J. M. Mackus | Eindhoven University of Technology |
| Diana Garcia-Alonso | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Pt
Other Pt
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Unknown
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| PEN, Polyethylene Napthalate |
| PET, Polyethylene Terephthalate |
| Paper |
| Cotton |
| SiO2 |
| Al2O3 |
Notes
| 114 |