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Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
Type:
Conference Proceedings
Info:
ECS Transactions, 41 (2) 321-330 (2011)
Date:
2011-10-09
Author Information
| Name | Institution |
|---|---|
| Merijn E. Donders | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Peter H. L. Notten | Eindhoven University of Technology |
Films
Plasma LiCoO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Microstructure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Charge Capacity
Analysis: Galvanostatic Cycling
Characteristic: Electrochemical Performance
Analysis: Galvanostatic Cycling
Substrates
| Si with native oxide |
| SiO2 |
| Pt |
Notes
| 1438 |