
Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
Type:
Conference Proceedings
Info:
ECS Transactions, 41 (2) 321-330 (2011)
Date:
2011-10-09
Author Information
Name | Institution |
---|---|
Merijn E. Donders | Eindhoven University of Technology |
Harm C. M. Knoops | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Peter H. L. Notten | Eindhoven University of Technology |
Films
Plasma LiCoO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Microstructure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Charge Capacity
Analysis: Galvanostatic Cycling
Characteristic: Electrochemical Performance
Analysis: Galvanostatic Cycling
Substrates
Si with native oxide |
SiO2 |
Pt |
Notes
1438 |