Publication Information

Title:
Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
Type:
Conference Proceedings
Info:
ECS Transactions, 41 (2) 321-330 (2011)
Date:
2011-10-09

Author Information

Name Institution
Merijn E. DondersEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Peter H. L. NottenEindhoven University of Technology

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Microstructure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Charge Capacity
Analysis: Galvanostatic Cycling

Characteristic: Electrochemical Performance
Analysis: Galvanostatic Cycling

Substrates

Si with native oxide
SiO2
Pt

Keywords

Batteries

Notes

1438