Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Merijn E. Donders Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Merijn E. Donders returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
2Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
3Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
4Remote Plasma ALD of Platinum and Platinum Oxide Films
5Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
6Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
7Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition