Remote Plasma ALD of Platinum and Platinum Oxide Films

Type:
Journal
Info:
Electrochemical and Solid-State Letters, 12 (7) G34-G36 (2009)
Date:
2009-04-27

Author Information

Name Institution
Harm C. M. KnoopsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Merijn E. DondersEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Peter H. L. NottenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Pt


Plasma PtO2


Thermal Pt


Plasma Pt


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Dielectric Constant, Permittivity
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)
SiO2

Keywords

Plasma-Enhanced Atomic Layer Deposition

Notes

Pt and PtO2 can be distinguished by very different dielectric functions from ellipsometry. Also PtO2 very resistive.
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