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Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
Type:
Journal
Info:
Journal of Power Sources, Volume 203, 1 April 2012, Pages 72-77.
Date:
2012-04-01
Author Information
| Name | Institution |
|---|---|
| Merijn E. Donders | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Peter H. L. Notten | Eindhoven University of Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Density
Analysis: -
Characteristic: Morphology, Roughness, Topography
Analysis: -
Characteristic: Electrochemical Performance
Analysis: Charge/Discharge Cycling
Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry
Characteristic: Electrochemical Performance
Analysis: GITT, Galvanostatic Intermittent Titration Technique
Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Substrates
| TiN |
Notes
| 17 |