Publication Information

Title: Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films

Type: Presentation

Info: ALD 2009

Date: 2008-11-03

DOI: No DOI

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Pt using Custom

Deposition Temperature Range N/A

94442-22-5

7782-44-7

Thermal Pt using Custom

Deposition Temperature Range N/A

94442-22-5

7782-44-7

Plasma Pt using Custom

Deposition Temperature Range N/A

94442-22-5

7782-44-7

1333-74-0

Plasma PtO2 using Custom

Deposition Temperature Range N/A

94442-22-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Thickness

XRR, X-Ray Reflectivity

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Density

XRR, X-Ray Reflectivity

-

Density

RBS, Rutherford Backscattering Spectrometry

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Resistivity, Sheet Resistance

Four-point Probe

-

Substrates

Si(100)

SiO2

Keywords

Catalysts

DRAM Electrode

Notes

Pt and PtO2 process the same except PtO2 has longer O2 plasma step.

Same content as paper in database with similar name.

Showed 16:1 conformal Pt deposition.

Database entry based entirely on presentation pdf. Recorded talk was not reviewed.

68



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