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Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
Type:
Journal
Info:
Applied Physics Letters 92, 202902 (2008)
Date:
2008-04-16
Author Information
| Name | Institution |
|---|---|
| Tae Joo Park | Seoul National University |
| Jeong Hwan Kim | Seoul National University |
| Jae Hyuck Jang | Seoul National University |
| Kwang Duk Na | Seoul National University |
| Cheol Seong Hwang | Seoul National University |
| Gee-Man Kim | Quros. Co., Ltd. |
| Kang Joon Choi | Quros. Co., Ltd. |
| Jae Hak Jeong | Quros. Co., Ltd. |
Films
Plasma TaCN
Plasma TaCN
Film/Plasma Properties
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Flat Band Voltage
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: CET, capacitance equivalent thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Substrates
| HfO2 |
| SiO2 |
Notes
| 1336 |