The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
Type:
Journal
Info:
Applied Physics Letters 91, 252106 (2007)
Date:
2007-11-27
Author Information
| Name | Institution |
|---|---|
| Tae Joo Park | Seoul National University |
| Jeong Hwan Kim | Seoul National University |
| Jae Hyuck Jang | Seoul National University |
| Kwang Duk Na | Seoul National University |
| Cheol Seong Hwang | Seoul National University |
| Jong Hoon Kim | Quros. Co., Ltd. |
| Gee-Man Kim | Quros. Co., Ltd. |
| Jae Ho Choi | Quros. Co., Ltd. |
| Kang Joon Choi | Quros. Co., Ltd. |
| Jae Hak Jeong | Quros. Co., Ltd. |
Films
Plasma TaCN
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XRF, X-Ray Fluorescence
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| SiO2 |
Notes
| 1325 |