Publication Information

Title:
Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
Type:
Journal
Info:
J. Mater. Chem. C, 2014, 2, 7570
Date:
2014-07-11

Author Information

Name Institution
Yijun ZhangXi'an Jiaotong University
Wei RenXi'an Jiaotong University
Zhuangde JiangXi'an Jiaotong University
Shuming YangXi'an Jiaotong University
Weixuan JingXi'an Jiaotong University
Peng ShiXi'an Jiaotong University
Xiaoqing WuXi'an Jiaotong University
Zuo-Guang YeXi'an Jiaotong University

Films

Plasma Graphene

Hardware used: Picosun R200

CAS#: 71-43-2


CAS#: 7440-37-1

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Substrates

Cu

Keywords

Graphene
PEALD Film Development

Notes

112