The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
Type:
Journal
Info:
J. Mater. Chem. C, 2014, 2, 7570
Date:
2014-07-11
Author Information
| Name | Institution |
|---|---|
| Yijun Zhang | Xi'an Jiaotong University |
| Wei Ren | Xi'an Jiaotong University |
| Zhuangde Jiang | Xi'an Jiaotong University |
| Shuming Yang | Xi'an Jiaotong University |
| Weixuan Jing | Xi'an Jiaotong University |
| Peng Shi | Xi'an Jiaotong University |
| Xiaoqing Wu | Xi'an Jiaotong University |
| Zuo-Guang Ye | Xi'an Jiaotong University |
Films
Plasma Graphene
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: Raman Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Cu |
Notes
| 112 |