Publication Information

Title:
Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 152-157
Date:
2007-01-10

Author Information

Name Institution
Antti NiskanenUniversity of Helsinki
Kai ArstilaUniversity of Helsinki
Markku A. LeskeläUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Refractive Index
Analysis: Reflectometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Compositional Depth Profiling
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Photocatalytic Activity
Analysis: Methylene Blue Degradation

Characteristic: Wetting Angle
Analysis: Sessile Drop Tests

Substrates

Silicon
Glass
Pt
RuO2
Polycarbonate
Polypropene
Wool

Keywords

Notes

1330