Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 152-157
Date:
2007-01-10
Author Information
| Name | Institution |
|---|---|
| Antti Niskanen | University of Helsinki |
| Kai Arstila | University of Helsinki |
| Markku A. Leskelä | University of Helsinki |
| Mikko K. Ritala | University of Helsinki |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Refractive Index
Analysis: Reflectometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Compositional Depth Profiling
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Photocatalytic Activity
Analysis: Methylene Blue Degradation
Characteristic: Wetting Angle
Analysis: Sessile Drop Tests
Substrates
| Silicon |
| Glass |
| Pt |
| RuO2 |
| Polycarbonate |
| Polypropene |
| Wool |
Notes
| 1330 |