Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Custom Microwave Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Microwave Plasma hardware returned 19 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
2Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
3Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
4Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
5Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
6Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
7Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
8Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
9Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
10Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
11Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
12Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
13Gallium nitride thin films by microwave plasma-assisted ALD
14Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
15A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
16Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
17Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
18Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
19Atomic layer deposition of YMnO3 thin films