Atomic layer deposition of YMnO3 thin films

Type:
Journal
Info:
Journal of Magnetism and Magnetic Materials 498 (2020) 166146
Date:
2019-11-19

Author Information

Name Institution
Ju H. ChoiKorea Photonics Technology Institute
Calvin D. PhamUniversity of California - Los Angeles (UCLA)
James DormanUniversity of California - Los Angeles (UCLA)
Taeseung KimUniversity of California - Los Angeles (UCLA)
Jane P. ChangUniversity of California - Los Angeles (UCLA)

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: EXAFS, Extended X-ray Absorption Fine Structure

Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device

Substrates

Si(111)
YSZ

Keywords

Notes

1603