Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Jane P. Chang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jane P. Chang returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
2Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
3Atomic layer deposition of YMnO3 thin films
4Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
5Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
6Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
7Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
8Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
9Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
10Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition