Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
Type:
Journal
Info:
Journal of Applied Physics 101, 123116 (2007)
Date:
2007-05-04
Author Information
Name | Institution |
---|---|
J. Hoang | University of California - Los Angeles (UCLA) |
Trinh Tu Van | University of California - Los Angeles (UCLA) |
M. Sawkar-Mathur | University of California - Los Angeles (UCLA) |
Bram Hoex | Eindhoven University of Technology |
Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
R. Ostroumov | University of California - Los Angeles (UCLA) |
K. L. Wang | University of California - Los Angeles (UCLA) |
John R. Bargar | SLAC National Accelerator Laboratory |
Jane P. Chang | University of California - Los Angeles (UCLA) |
Films
Plasma Er:Y2O3
Hardware used: Custom
Er(TMHD)3, Er(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate
CAS#: 35733-23-4
CAS#: 7782-44-7
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Optical Properties
Analysis: EXAFS, Extended X-ray Absorption Fine Structure
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Characteristic: Optical Absorption
Analysis: CRDS, Cavity Ring-Down Spectroscopy
Characteristic: Optical Absorption
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
Hereaus Suprasil 300 |
SiO2 |
Notes
1327 |