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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
tris(2,2,6,6-tetramethyl-3,5-heptanedionato) yttrium Y(tmhd)3, CAS# 15632-39-0
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Ereztech | πΊπΈ | 2,2,6,6-Tetramethyl-3,5-heptanedionate yttrium(III) |
| 2 | Strem Chemicals, Inc. | πΊπΈ | Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III), 98+% (99.9%-Y) [Y(TMHD)3] |
| 3 | EpiValence | π¬π§ | Yttrium tetramethylheptanedionate |
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.