Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals

Type:
Journal
Info:
Surface Science 596 (2005) 1–11
Date:
2005-09-15

Author Information

Name Institution
Trinh Tu VanUniversity of California - Los Angeles (UCLA)
Jane P. ChangUniversity of California - Los Angeles (UCLA)

Films

Plasma Y2O3


Plasma Er2O3


Film/Plasma Properties

Characteristic: Unknown
Analysis: QCM, Quartz Crystal Microbalance

Characteristic: Interfacial Layer
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

TaN
SiO2
Si(100)

Keywords

Beta-Diketonate
O Radicals
Thin Film
Atomic Layer Deposition
CMOS Gate Dielectric
Optical
Miniature Planar Optical Devices

Notes

50