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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
Type:
Journal
Info:
APPLIED PHYSICS LETTERS 87, 011907 2005
Date:
2005-07-01
Author Information
| Name | Institution |
|---|---|
| Trinh Tu Van | University of California - Los Angeles (UCLA) |
| Jane P. Chang | University of California - Los Angeles (UCLA) |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence
Substrates
| Si(100) |
Keywords
| Optical |
| Er-doping |
| Photoluminescence |
Notes
| References 11 and 13 discuss Er2O3 and Y2O3 processes. |
| 36 |