The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
Type:
Journal
Info:
Applied Surface Science 246 (2005) 250 - 261
Date:
2004-11-04
Author Information
| Name | Institution |
|---|---|
| Trinh Tu Van | University of California - Los Angeles (UCLA) |
| Yu-Wei Chang | University of California - Los Angeles (UCLA) |
Films
Plasma Er2O3
Hardware used: Custom Microwave Plasma
Er(TMHD)3, Er(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) erbium, Erbium dipivaloylmethanate
CAS#: 35733-23-4
CAS#: 7782-44-7
Plasma Y2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Surface Reactions
Analysis: QCM, Quartz Crystal Microbalance
Substrates
| Si(100) |
Notes
| 1263 |