Publication Information

Title:
Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
Type:
Journal
Info:
REVIEW OF SCIENTIFIC INSTRUMENTS 85, 103510 (2014)
Date:
2014-10-09

Author Information

Name Institution
A. DechanaSongkhla Rajabhat University
P. ThamboonChiang Mai University
D. BoonyawanChiang Mai University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Electron Density, ne
Analysis: Langmuir Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry

Substrates

SiO2

Keywords

Notes

Plasma characteristics and PEALD Al2O3 demonstration on custom microwave plasma ALD system.
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