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Publication Information

Title: Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

Type: Journal

Info: REVIEW OF SCIENTIFIC INSTRUMENTS 85, 103510 (2014)

Date: 2014-10-09

DOI: http://dx.doi.org/10.1063/1.4898802

Author Information

Name

Institution

Songkhla Rajabhat University

Chiang Mai University

Chiang Mai University

Films

Deposition Temperature = 150C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Plasma Species

OES, Optical Emission Spectroscopy

Ocean Optics S2000

Electron Density, ne

Langmuir Probe

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Thickness

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

RBS, Rutherford Backscattering Spectrometry

Unknown

Substrates

SiO2

Keywords

Notes

Plasma characteristics and PEALD Al2O3 demonstration on custom microwave plasma ALD system.

189



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