Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
Type:
Journal
Info:
REVIEW OF SCIENTIFIC INSTRUMENTS 85, 103510 (2014)
Date:
2014-10-09
Author Information
Name | Institution |
---|---|
A. Dechana | Songkhla Rajabhat University |
P. Thamboon | Chiang Mai University |
Dheerawan Boonyawan | Chiang Mai University |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Electron Density, ne
Analysis: Langmuir Probe
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
SiO2 |
Notes
Plasma characteristics and PEALD Al2O3 demonstration on custom microwave plasma ALD system. |
189 |