Publication Information

Title:
Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 02D101 (2016)
Date:
2015-09-18

Author Information

Name Institution
Yukio FukudaTokyo University of Science
Daichi YamadaTokyo University of Science
Tomoya YokohiraTokyo University of Science
Kosei YanachiTokyo University of Science
Chiaya YamamotoUniversity of Yamanashi
Byeonghak YooUniversity of Yamanashi
Junji YamanakaUniversity of Yamanashi
Tetsuya SatoUniversity of Yamanashi
Toshiyuki TakamatsuSST Inc.
Hiroshi OkamotoHirosaki University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Plasma Species
Analysis: Langmuir Probe

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Substrates

Ge

Keywords

Notes

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