Publication Information

Title: Highly reflective polymeric substrates functionalized utilizing atomic layer deposition

Type: Journal

Info: Applied Physics Letters 107, 061602 (2015)

Date: 2015-07-28

DOI: http://dx.doi.org/10.1063/1.4928375

Author Information

Name

Institution

CIC Nanogune Consolider

IK4-Tekniker

Torresol Energy (SENER Group)

CIC Nanogune Consolider

IK4-Tekniker

IK4-Tekniker

CIC Nanogune Consolider

Films

Other TiO2 using Unknown

Deposition Temperature = 120C

546-68-9

7722-84-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

-

Images

Optical Microscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Hardness

Nanoindentation

-

Substrates

PTFE

Keywords

Notes

Examined O2 plasma pretreatement of Teflon prior to thermal ALD TiO2 process.

382



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