Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
Type:
Journal
Info:
Applied Physics Letters 107, 061602 (2015)
Date:
2015-07-28
Author Information
Name | Institution |
---|---|
Ana Zuzuarregui | CIC Nanogune Consolider |
Borja Coto | IK4-Tekniker |
Jorge RodrÃguez | Torresol Energy (SENER Group) |
Keith E. Gregorczyk | CIC Nanogune Consolider |
Unai Ruiz de Gopegui | IK4-Tekniker |
Javier Barriga | IK4-Tekniker |
Mato Knez | CIC Nanogune Consolider |
Films
Film/Plasma Properties
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: Optical Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Hardness
Analysis: Nanoindentation
Substrates
PTFE |
Notes
Examined O2 plasma pretreatement of Teflon prior to thermal ALD TiO2 process. |
382 |