The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films

Type:
Journal
Info:
Surface & Coatings Technology 324 (2017) 243-248
Date:
2017-05-29

Author Information

Name Institution
Yunfei WangAjou University
Andre RicardUniversité de Toulouse
Jean-Philippe SarretteUniversité de Toulouse
Ansoon KimKorea Research Institute of Standards and Science (KRISS)
Yu Kwon KimAjou University

Films

Thermal TiO2


Other TiON


Other TiON


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(111)

Keywords

Notes

1651