Publication Information

Title: Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma

Type: Journal

Info: physica status solidi (a)

Date: 2014-11-18

DOI: http://dx.doi.org/10.1002/pssa.201431630

Author Information

Name

Institution

Hanyang University

Films

Plasma TiO2 using Unknown

Deposition Temperature Range = 170-400C

0-0-0

7782-44-7

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Mobility

AFM, Atomic Force Microscopy

-

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

-

Thickness

Ellipsometry

-

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

-

Substrates

Keywords

DRAM capacitor

PEALD Film Development

High-k Dielectric Thin Films

Notes

254



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