Publication Information

Title:
Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
Type:
Journal
Info:
physica status solidi (a)
Date:
2014-11-18

Author Information

Name Institution
Chunho KangHanyang University

Films

Plasma TiO2


Plasma TiO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Mobility
Analysis: AFM, Atomic Force Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Keywords

DRAM capacitor
PEALD Film Development
High-k Dielectric Thin Films

Notes

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