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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
Type:
Journal
Info:
ChemSusChem 2017, 10, 3754-3759
Date:
2017-06-28
Author Information
| Name | Institution |
|---|---|
| Ivan Turkevych | Chemical Materials Evaluation and Research Base (CEREBA) |
| Said Kazaoui | National Institute of Advanced Industrial Science and Technology |
| Eisuke Ito | Chemical Materials Evaluation and Research Base (CEREBA) |
| Toshiyuki Urano | Chemical Materials Evaluation and Research Base (CEREBA) |
| Koji Yamada | Nihon University |
| Hiroshi Tomiyasu | Chemical Materials Evaluation and Research Base (CEREBA) |
| Hideo Yamagishi | Chemical Materials Evaluation and Research Base (CEREBA) |
| Michio Kondo | National Institute of Advanced Industrial Science and Technology |
| Shinji Aramaki | Chemical Materials Evaluation and Research Base (CEREBA) |
Films
Film/Plasma Properties
Substrates
| FTO, F:SnO2 |
Notes
| 1115 |