Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
Type:
Journal
Info:
Nature Nanotechnology volume 5, pages 148-153 (2010)
Date:
2009-11-25
Author Information
Name | Institution |
---|---|
Deok-Hwang Kwon | Seoul National University |
Kyung Min Kim | Seoul National University |
Jae Hyuck Jang | Seoul National University |
Jong Myeong Jeon | Seoul National University |
Min Hwan Lee | Seoul National University |
Gun Hwan Kim | Seoul National University |
Xiang-Shu Li | Samsung Advanced Institute of Technology |
Gyeong-Su Park | Samsung Advanced Institute of Technology |
Bora Lee | Ewha Womans University |
Seungwu Han | Seoul National University |
Miyoung Kim | Seoul National University |
Cheol Seong Hwang | Seoul National University |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistive Switching
Analysis: I-V, Current-Voltage Measurements
Substrates
Pt |
Notes
1189 |