The publication database currently has 1495 entries.
Search from:
187 Films Compositions
401 Precursors and Plasma Gases
73 Deposition Hardwares
238 Film and Plasma Characteristics
79 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
About plasma-ald.com
Contact Us
Advertising
Recent Database Additions
Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
Search 1495 plasma ALD publications by:
Search 1495 plasma ALD publications by:
Publication Information
Title:
Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 31, 031509 (2013)
Date:
2013-03-12
Author Information
| Name | Institution |
|---|---|
| Rohan P. Chaukulkar | Colorado School of Mines |
| Sumit Agarwal | Colorado School of Mines |
Films
Film/Plasma Properties
Substrates
| ZnSe |
Keywords
Notes
| The plasma ALD TiO2 film was just the substrate for the main study of the paper which was thermal ALD TiO2 from TTIP and TiCl4. |
| 594 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |