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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 31, 031509 (2013)
Date:
2013-03-12
Author Information
| Name | Institution |
|---|---|
| Rohan P. Chaukulkar | Colorado School of Mines |
| Sumit Agarwal | Colorado School of Mines |
Films
Film/Plasma Properties
Substrates
| ZnSe |
Keywords
Notes
| The plasma ALD TiO2 film was just the substrate for the main study of the paper which was thermal ALD TiO2 from TTIP and TiCl4. |
| 594 |