Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 31, 031509 (2013)
Date:
2013-03-12
Author Information
Name | Institution |
---|---|
Rohan P. Chaukulkar | Colorado School of Mines |
Sumit Agarwal | Colorado School of Mines |
Films
Film/Plasma Properties
Substrates
ZnSe |
Keywords
Notes
The plasma ALD TiO2 film was just the substrate for the main study of the paper which was thermal ALD TiO2 from TTIP and TiCl4. |
594 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |