Publication Information

Title:
Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 31, 031509 (2013)
Date:
2013-03-12

Author Information

Name Institution
Rohan P. ChaukulkarColorado School of Mines
Sumit AgarwalColorado School of Mines

Films

Plasma TiO2


Film/Plasma Properties

Substrates

ZnSe

Keywords

Notes

The plasma ALD TiO2 film was just the substrate for the main study of the paper which was thermal ALD TiO2 from TTIP and TiCl4.
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