Publication Information

Title: Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors

Type: Journal

Info: Journal of Vacuum Science & Technology A 31, 031509 (2013)

Date: 2013-03-12

DOI: http://dx.doi.org/10.1116/1.4798385

Author Information

Name

Institution

Rohan P. Chaukulkar

Colorado School of Mines

Sumit Agarwal

Colorado School of Mines

Films

Plasma TiO2 using Custom

Deposition Temperature = 150C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

ZnSe

Keywords

Notes

The plasma ALD TiO2 film was just the substrate for the main study of the paper which was thermal ALD TiO2 from TTIP and TiCl4.

594


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2019 plasma-ald.com