Publication Information

Title:
Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
Type:
Journal
Info:
Chem. Vap. Deposition 2002, 8, No. 5, p. 195-197
Date:
2002-04-29

Author Information

Name Institution
Deok-Sin KilHynix Semiconductor
Jong-Min LeeHynix Semiconductor
Jae-Sung RohHynix Semiconductor

Films

Plasma SrO


Plasma TiO2



Thermal SrO


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Si(100)

Keywords

Capacitors

Notes

Sr precursor 0.07M in menthanol with liquid delivery.
Astron Astex remote plasma generator.
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