Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
Type:
Journal
Info:
Chem. Vap. Deposition 2002, 8, No. 5, p. 195-197
Date:
2002-04-29
Author Information
Name | Institution |
---|---|
Deok-Sin Kil | Hynix Semiconductor |
Jong-Min Lee | Hynix Semiconductor |
Jae-Sung Roh | Hynix Semiconductor |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
Si(100) |
Notes
Sr precursor 0.07M in menthanol with liquid delivery. |
Astron Astex remote plasma generator. |
124 |